Our paper “Area-Selective Atomic Layer Deposition Patterned by Electrohydrodynamic-Jet Printing for Additive Manufacturing of Functional Materials and Devices” is published in ACS Nano. We demonstrate that E-jet printing of polymers with sub-micrometer linewidths (down to 312nm) can be used to block ALD deposition with sub-nm precision in the z-direction, representing a new additive nanomanufacturing platform. This is a collaborative paper with the Barton and Peterson research groups at UM. [link]
