Our new paper “Tunable Atomic Layer Deposition into Ultra-High-Aspect-Ratio (>60000:1) Aerogel Monoliths Enabled by Transport Modeling” is published in Chem. Mater. We demonstrate tunable control of the ALD infiltration depth into an aerogel monolith and develop a reaction-diffusion model to accurately describe the coating process. The model allows for co-optimization of the total deposition time and percentage of unreacted precursor, which are important for the manufacturability and sustainability of ALD processing. [link]
